| AVS 58th Annual International Symposium and Exhibition | |
| Advanced Surface Engineering Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | SE-ThM1 Characterization of Solution-Processed HfO2, HfSiO4, and ZrSiO4 Thin Films on Rigid and Flexible Substrates for Memristive Applications J.L. Tedesco, W. Zheng, O.A. Kirillov, S. Pookpanratana, A.A. Herzing, H.-J. Jang, P.P. Kavuri, N.V. Nguyen, C.A. Richter, National Institute of Standards and Technology |
| 8:20am | SE-ThM2 Invited Paper Tensile Testing of Substrate for Fracture Toughness of Thin Films Sam Zhang, X. Zhang, Nanyang Technological University, Singapore |
| 9:00am | SE-ThM4 Structure and Properties of TaN-(Ag,Cu) Nanocomposite Thin Films Jang Hsing Hsieh, S.Y. Hung, Ming Chi University of Technology, Taiwan, Republic of China, S.Y. Chang, National Chung Hsing University, Taiwan, Republic of China, C. Li, National Central University, Taiwan, Republic of China |
| 9:20am | SE-ThM5 Nanoporous Osmium-Ruthenium Thin Film Coatings for Dispenser Cathodes Phillip Swartzentruber, T.J. Balk, University of Kentucky |
| 9:40am | SE-ThM6 Influence of Chemistry and Structure on the Thermal Stability and Oxidation Resistance of Ti-Al-N Paul Mayrhofer, L. Chen, J. Paulitsch, Montanuniversität Leoben, Austria, Y. Du, Central South University, China |
| 10:40am | SE-ThM9 Design of Catalytically Active Nanostructured Coatings for Severe Tribological Applications Ali Erdemir, O.L. Eryilmaz, Argonne National Laboratory |
| 11:00am | SE-ThM10 Structure and Electrical Properties of Nb-Ge-C Nanocomposite Coatings Olof Tengstrand, Linköping University, Sweden, N. Nedfors, Uppsala University, Sweden, L. Fast, SP Tech. Res. Inst. of Sweden, A. Flink, Impact Coatings AB, Sweden, A.M. Andersson, ABB AB, Corporate Research, Sweden, U. Jansson, Uppsala University, Sweden, P. Eklund, L. Hultman, Linköping University, Sweden |
| 11:20am | SE-ThM11 Tuning the Properties of Chromium Oxynitride Coatings L. Castaldi, Oerlikon Balzers AG, Liechtenstein, Joerg Patscheider, EMPA, Switzerland, V. Shklover, ETH Zurich, Switzerland, D. Kurapov, A. Reiter, Oerlikon Balzers AG, Liechtenstein |
| 11:40am | SE-ThM12 Synthesis of Al-Cr-O and Al-Cr-O-N Thin Films in Corundum-Type Structure by Reactive r.f. Magnetron Sputtering Michael Stueber, Karlsruhe Institute of Technology (KIT), Germany, D. Diechle, Walter AG, Germany, H. Leiste, S. Ulrich, Karlsruhe Institute of Technology (KIT), Germany |