AVS 58th Annual International Symposium and Exhibition | |
Advanced Surface Engineering Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:00pm | SE+PS-ThA1 High-Power Impulse Magnetron Sputtering of WO3 - Influence of the Pulse Parameters on the Discharge Axel Hemberg, F. Renaux, J.P. Dauchot, Materia Nova, Belgium, R. Snyders, S. Konstantinidis, UMons, Belgium |
2:20pm | SE+PS-ThA2 A Versatile Magnetized Pulsed Cascaded Arc Source for Surface Modifications and Efficient Material Deposition Gregory De Temmerman, J.J. Zielinski, FOM Institute for Plasma Physics Rijnhuizen, Netherlands, L. Marot, D. Mathys, University of Basel, Switzerland, W. Melissen, FOM Institute for Plasma Physics Rijnhuizen, Netherlands, M.C.M. van de Sanden, FOM-Instituut for Plasma Physics Rijnhuizen & Eindhoven University of Technology, Netherlands |
2:40pm | SE+PS-ThA3 Invited Paper Pulsed Magnetron Sputtering Systems for Reactive Deposition of Oxide and Nitride Films Jaroslav Vlcek, J. Rezek, P. Steidl, University of West Bohemia, Czech Republic |
3:40pm | SE+PS-ThA6 Structure Evolution and Wear Mechanism in TiAlCN/VCN Nanoscale Multilayer Coatings Deposited by Reactive High Power Impulse Magnetron Sputtering Technology Papken Hovsepian, A.P. Ehiasarian, G.K. Kamath, Sheffield Hallam University, UK, R. Haasch, I. Petrov, University of Illinois at Urbana Champaign |
4:00pm | SE+PS-ThA7 Plasma Study and Interconnect Metallization using a Modulated Pulse Power (MPP) Hollow Cathode Magnetron Liang Meng, H. Yu, T.S. Cho, S. Jung, D.N. Ruzic, University of Illinois at Urbana Champaign |
4:20pm | SE+PS-ThA8 Structural and Optical Properties of Ultra-Thin Silver Films Deposited via High Power Impulse Magnetron Sputtering (HiPIMS) on Various Adhesion Layers Rachel Jakubiak, Air Force Research Laboratory, L. Sun, General Dynamics Information Technology, N. Murphy, Air Force Research Laboratory, A. Waite, Universal Technology Corporation, J. Jones, Air Force Research Laboratory |
4:40pm | SE+PS-ThA9 Inductively Coupled Impulse Sputtering (ICIS): A Novel Technique for Ionised PVD Arutiun Ehiasarian, D. Loch, Sheffield Hallam University, UK |