AVS 58th Annual International Symposium and Exhibition
    Spectroscopic Ellipsometry Focus Topic Thursday Sessions

Session EL+AS+EM+MS+PS+TF-ThA
Spectroscopic Ellipsometry for Photovoltaics, Metals and Oxide Thin Films

Thursday, November 3, 2011, 2:00 pm, Room 209
Moderator: Mariadriana Creatore, Eindhoven University of Technology, the Netherlands


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm EL+AS+EM+MS+PS+TF-ThA1 Invited Paper
Applications of Ellipsometry in Photovoltaics
Dean Levi, National Renewable Energy Laboratory
2:40pm EL+AS+EM+MS+PS+TF-ThA3
Comparison between Ex Situ and Real Time Spectroscopic Ellipsometry Measurements of Structurally Graded Si:H Thin Films
Nikolas Podraza, University of Toledo
3:00pm EL+AS+EM+MS+PS+TF-ThA4
Real-Time Spectroscopic Ellipsometry of Cu(In,Ga)Se2 Thin Film Deposition: Copper Transition in 3-Stage Co-Evaporation Process
Dinesh Attygalle, University of Toledo, V. Ranjan, Old Dominion University, P. Aryal, University of Toledo, S. Marsillac, Old Dominion University, R.W. Collins, University of Toledo
3:40pm EL+AS+EM+MS+PS+TF-ThA6
Bulk Hetrojunction Solar Cell Characterization by Phase Modulated Spectroscopic Ellipsometry
Kishore Uppireddi, L. Yan, HORIBA Scientific
4:00pm EL+AS+EM+MS+PS+TF-ThA7
In Situ Spectroscopic Ellipsometry during Atomic Layer Deposition of Pt, Pd and Ru
Noemi Leick, J.W. Weber, M.J. Weber, A.J.M. Mackus, H.C.M. Knoops, W.M.M. Kessels, Eindhoven University of Technology, Netherlands
4:20pm EL+AS+EM+MS+PS+TF-ThA8
Manipulating the Optical Properties of Metals: Sculptured Thin Films Coated by Atomic Layer Deposition
D. Schmidt, N. Ianno, E. Schubert, Mathias Schubert, University of Nebraska - Lincoln
4:40pm EL+AS+EM+MS+PS+TF-ThA9
Ellipsometric Characterisation of Porous Aluminium Oxide Supports
W. Ogieglo, N.E. Benes, Herbert Wormeester, MESA+ Institute for Nanotechnology, University of Twente, Enschede, The Netherlands
5:00pm EL+AS+EM+MS+PS+TF-ThA10
Optical Properties and Structure of Vanadium Oxide Thin Films
Michael Motyka, M.W. Horn, Pennsylvania State University, N.J. Podraza, University of Toledo
5:20pm EL+AS+EM+MS+PS+TF-ThA11
Sensitivity of Dielectric Properties of Vanadium Dioxide Thin Films to Growth Conditions
D.W. Ferrara, Robert Marvel, J. Nag, R.F. Haglund, Vanderbilt University