AVS 58th Annual International Symposium and Exhibition
    Vacuum Technology Division Tuesday Sessions
       Session VT-TuP

Paper VT-TuP5
Application of AutoResonant Ion Trap Mass Spectrometry (ART MS) to Vacuum Quality Measurement

Tuesday, November 1, 2011, 6:00 pm, Room East Exhibit Hall

Session: Vacuum Technology Poster Session & Student Poster Competition
Presenter: Philip Acomb, Brooks Automation, Inc., Granville-Phillips Products
Authors: P.D. Acomb, Brooks Automation, Inc., Granville-Phillips Products
G.A. Brucker, Brooks Automation, Inc., Granville-Phillips Products
J. Rathbone, Brooks Automation, Inc., Granville-Phillips Products
B.J. Horvath, Brooks Automation, Inc., Granville-Phillips Products
Correspondent: Click to Email
Autoresonant Ion Trap Mass Spectrometers (ART MS) have demonstrated significant benefits when applied to vacuum quality measurement at ultra-high vacuum (UHV) levels. Vacuum quality monitors based on ART MS technology are known to deliver more accurate gas analysis at UHV levels than any other competitive mass spectrometry technology presently used for residual gas analysis. The speed, accuracy and remote-sensing capabilities of ART MS technology for vacuum quality measurement at UHV levels will be explained and several application examples will be presented. The low outgassing rates associated to ART MS sensors will be justified and explained in terms of surface area and power dissipation considerations. Gas analysis results, data-acquisition rates and detection limit values will be listed and compared against similar results obtained with legacy instrumentation including quadrupole-based residual gas analyzers. Instrument optimization strategies for UHV applications will be disclosed.