AVS 58th Annual International Symposium and Exhibition
    Thin Film Division Thursday Sessions
       Session TF+EM+SS-ThA

Paper TF+EM+SS-ThA4
Micrometer- and Nanometer-Scale Patterning of Azide-Functionalized Self-assembled Monolayers on Gold and Aluminum Oxide Surfaces

Thursday, November 3, 2011, 3:00 pm, Room 110

Session: Applications of Self Assembled Monolayers
Presenter: Osama El Zubir, University of Sheffield, UK
Authors: O. El Zubir, University of Sheffield, UK
I. Barlow, University of Sheffield, UK
G. Leggett, University of Sheffield, UK
N. Williams, University of Sheffield, UK
Correspondent: Click to Email
Self-assembled monolayers (SAMs) have been prepared by the adsorption of [11-(4-azido-benzoylamino)-undecyl] phosphonic acid on aluminum oxide and by the adsorption of 11-(4-azido-benzoylamino)-undecylthiol. Exposure to near UV radiation causes elimination of nitrogen and the creation of a reactive nitrene species. Quantitative studies by X-ray photoelectron spectroscopy (XPS) and contact angle measurement show that the reaction is complete after an exposure of 20 J cm–2. The reaction enables selective introduction of primary amines to the surface. By exposure of the azide under a solution of the amine, derivatization may be carried out with high efficiency, providing a simple pathway for the creation of a variety of multiple-component surface chemical patterns. Micropatterned surfaces were fabricated by exposure the SAMs to UV-laser (λ=325 nm) through a mask in presence of amines. Photopatterning was carried out at the nanometer scale by using scanning near-field photolithography (SNP) in which a scanning near-field optical microscope (SNOM) coupled to a UV laser (λ=325 nm) is utilized as the light source. Selective modification of azide terminated monolayers on aluminum oxide by protein-resistant molecules enabled the fabrication of protein nanopatterns that could be imaged by fluorescence microscopy.