AVS 58th Annual International Symposium and Exhibition | |
Surface Science Division | Thursday Sessions |
Session SS-ThM |
Session: | Oxide Surface Structure & Reactivity |
Presenter: | Yujung Dong, Virginia Tech |
Authors: | Y. Dong, Virginia Tech D.F. Cox, Virginia Tech |
Correspondent: | Click to Email |
The reactions of methyl (CH3) and methylene (CH2) surface species formed from the dissociation of halogenated methanes have been studied with temperature programmed desorption over Cr2O3(0001). Methyl fragments undergo a rate-limiting dehydrogenation to methylene and produce methane (CH4) and ethylene (CH2=CH2) as the primary products. Comparison to earlier results for the Cr2O3(1012) surface show that methyl dehydrogenation is a structure-insensitive reaction, with the barrier to dehydrogenation being insensitive to the surface cation coordination number and/or local Cr–O site pair geometry. The ethylene formed from the dehydrogenation of CH3 is associated with the surface diffusion of methylene species and subsequent coupling (C-C bond formation) reactions.
Separate studies of the reaction of methylene show that surface diffusion and coupling to ethylene can occur at lower temperatures than required for CH3 dehydrogenation. The diffusion-limited coupling of CH2 appears to be a structure-sensitive reaction, with the barrier to surface diffusion about 25 kJ/mol higher on Cr2O3(0001) than the (1012) surface.