Vapor-liquid-solid (VLS) is a powerful method enabling fabrication of single crytalline semiconductor nanowires in feature sizes ranging from nano to micro scales. On the other hand, control of nanowire growth direction by using VLS technique is still challenging. In this presentation, we demonstrate a new approach, called vapor-liquid-solid glancing angle deposition (VLS-GLAD), of fabricating crystalline semiconductor nanowire arrays with controlled geometry. VLS-GLAD is a physical vapor deposition based nanowire fabrication technique which relies on selective deposition of source atoms onto metal catalyst nanoislands placed on a crystal wafer. In this technique, collimated obliquely incident flux of source atoms selectively deposit on catalyst islands by using “shadowing effect”. Geometrical showing effect combined with VLS growth mechanism leads to the growth of crystalline semiconductor nanowire arrays. In this work, we show the morphological and structural properties of tilted single crystal semiconductor nanowire arrays fabricated by utilizing a conventional thermal evaporation system for VLS-GLAD.