| AVS 58th Annual International Symposium and Exhibition | |
| Nanomanufacturing Science and Technology Focus Topic | Tuesday Sessions |
| Session NM+MN+MS+TF-TuM |
| Session: | Lithography Strategies for Nanomanufacturing |
| Presenter: | Teri Odom, Northwestern University |
| Correspondent: | Click to Email |
The prototyping of nanoscale features has rarely been separated from the scaling of them. In order to create arbitrary patterns, serial techniques such as e-beam lithography or focused ion beam milling must start from scratch every time; also, the patterns cannot be generated over large areas. In contrast, parallel fabrication methods such as molding, imprint lithography and soft lithography can scale patterns, but they are limited to transferring the same pattern on the mold. The development of new tools that can combine the strengths of serial approaches (prototyping patterns, high resolution) with those of parallel ones (high throughput, large patterned areas) is critical for next-generation applications based on nanostructures.
This talk will describe an all-moldable nanofabrication platform that can generate—from a single master—large-area nanoscale patterns with programmable densities, fill factors, and lattice symmetries. Solvent-assisted nanoscale embossing (SANE) can increase the spacing of patterns up to 100% as well as decrease them down to 50% in a single step by stretching or heating a thermoplastic substrate. In addition, SANE can reduce critical feature sizes as small as 45% compared to those on a master by controlled swelling of patterned molds with different solvents. SANE can also produce different and reconfigurable lattice symmetries, which enables new opportunities to manipulate the electronic, photonic, and magnetic properties of nanomaterials.