AVS 58th Annual International Symposium and Exhibition
    Applied Surface Science Division Monday Sessions
       Session AS-MoM

Paper AS-MoM9
Using A C60 Ion Source For Routine Surface Chemical Analyses

Monday, October 31, 2011, 11:00 am, Room 102

Session: Quantitative Surface Chemical Analysis and Technique Development - Part I
Presenter: William Stickle, HP ADL Corvallis
Authors: W. Stickle, HP ADL Corvallis
M.D. Johnson, HP ADL Corvallis
D.K. Bilich, HP ADL Corvallis
C. Knutson, Oregon State University
W. Wang, Oregon State University
W. Cowell, Oregon State University
Correspondent: Click to Email
C60+ ion sources are becoming one of the routinely used tools in the surface chemical analysis laboratory. While finding early acceptance and utility in the TOF SIMS community because of its direct applicability to organic systems, the C60 ion source is now a standard option for photoelectron spectroscopy tools. Routine use of this ion source requires characterization and understanding of the surface that is being created during the ion milling process. Such characterizations include the shape and roughness of the resulting surface, changes in chemistry of the surface created by the ion milling process and changes in the mechanical characteristics of the surface that might influence the interpretation of the surface analytical results. Full characterization requires the preparation of standards and also validation of the measurements. The characterization of the application of the C60 ion source for a variety of common polymers such as PMMA, SU8 and polycarbonate are discussed. Further, anticipating the examination of mixed mode systems, the application of the C60+ source for the characterization of inorganic materials such as titania, hafnia and alumina multilayered structures as well as metal-metal oxide layered structures is presented where sputter induced chemistry from the C60+ source is observed.