AVS 57th International Symposium & Exhibition
    Thin Film Tuesday Sessions

Session TF-TuA
ALD/CVD: Surface Chemistry and Fundamentals

Tuesday, October 19, 2010, 2:00 pm, Room Ruidoso
Moderator: S.M. Rossnagel, IBM Research


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm TF-TuA1
Studying Roll-to-Roll ALD Process Conditions Using a Moving Substrate Under a Gas Source Coating Head
R. Fitzpatrick, Z.M. Gibbs, S.M. George, University of Colorado
2:20pm TF-TuA2
Reactive Intermediates during Atomic Layer Deposition of Aluminum Oxide from Ozone and an Oxygen Plasma
V.R. Rai, Colorado School of Mines, V. Vandalon, Eindhoven University of Technology, Netherlands, S. Agarwal, Colorado School of Mines
2:40pm TF-TuA3
Synthesis of Micro/Mesoporous Alumina Fibers by Gas Phase Infiltration of Polyesters with Trimethyl Aluminum and Water
B. Gong, Q. Peng, C. Devine, K. Lee, G.N. Parsons, North Carolina State University
3:00pm TF-TuA4
Growth Rate Control in ALD by Surface Functionalization: Alkyl Alcohols on Metal Oxides
A. Yanguas-Gil, J.W. Elam, Argonne National Laboratory
4:00pm TF-TuA7
Waterless TiO2 Atomic Layer Deposition using Titanium Tetrachloride and Titanium Tetraisopropoxide
V.R. Anderson, A.S. Cavanagh, A.I. Abdulagatov, Z.M. Gibbs, S.M. George, University of Colorado
4:20pm TF-TuA8
Growth Mechanism and Properties of MgxZn(1-x)O Nanocomposites by Atomic Layer Deposition
Q. Peng, A.U. Mane, J.W. Elam, Argonne National Laboratory
4:40pm TF-TuA9
Nucleation and Growth of Conformal and Ultrathin Pt Films on Al2O3 and W Substrates Using Plasma Enhanced ALD
L. Baker, A.S. Cavanaugh, D. Seghete, S.M. George, University of Colorado, A.J.M. Mackus, E.W.M.M. Kessels, Eindhoven University of Technology, Netherlands, Z.Y. Liu, F.T. Wagner, General Motors Research & Development
5:00pm TF-TuA10
Homogeneous Thermal Decomposition of Triethylaluminum: Effect of NH3
J. Lee, T.J. Anderson, University of Florida
5:20pm TF-TuA11
Surface Reactions of TiCl4 and Al(CH3)3 on GaAs(100)
B. Granados, A.J. Muscat, University of Arizona
5:40pm TF-TuA12
Atomic Layer Deposition of Co-Al Films Studied by In-Situ Infrared Spectroscopy
J. Kwon, Y.J. Chabal, University of Texas at Dallas, J. Anthis, R. Kanjolia, SAFC Hitech