| AVS 57th International Symposium & Exhibition | |
| Vacuum Technology | Wednesday Sessions |
| Session VT-WeM |
| Session: | Accelerators, Large Vacuum Systems, and Vacuum Surfaces |
| Presenter: | S. Kato, KEK-High Energy Accelerator Research Organization, Japan |
| Authors: | S. Kato, KEK-High Energy Accelerator Research Organization, Japan M. Nishiwaki, KEK-High Energy Accelerator Research Organization, Japan P.V. Tyagi, KEK-High Energy Accelerator Research Organization, Japan S. Azuma, KEK-High Energy Accelerator Research Organization, Japan F. Yamamoto, KEK-High Energy Accelerator Research Organization, Japan |
| Correspondent: | Click to Email |
However, hydrofluoric and sulfuric acid mixture usually used in the EP process is harmful and requires us carefully controlled handling of it and the many additional facilities. In this article, we propose a new application of electrochemical buffing onto niobium SRF cavity. In the method of electrochemical buffing, a rotating disk with abrasive fine particles where electrolyte is supplied is pressed against the workpiece. The disk and the work function as a cathode and an anode, respectively and an aqueous solution of sodium nitrate is used for the electrolyte. This technique brings us a couple of advantages like high etching rate, ultra small surface roughness, cost-effective and environment-compatible polishing.