AVS 57th International Symposium & Exhibition
    Vacuum Technology Tuesday Sessions
       Session VT+MS-TuM

Paper VT+MS-TuM9
Modeling, Design, Fabrication, and Characterization of a Pulsed Vacuum System

Tuesday, October 19, 2010, 10:40 am, Room Laguna

Session: Outgassing, Contamination Control, and Process Modeling
Presenter: Z.C. Leseman, University of New Mexico
Authors: Z.C. Leseman, University of New Mexico
J. Butner, University of New Mexico
Correspondent: Click to Email
Systems utilizing low to medium vacuum levels are becoming increasing popular due to packaging of micro and nanoelectronic devices, exploration of surface phehomena, and gas-phase etching of materials. In this work, pulsed vacuum systems are modeled, designed, fabricated, and characterized. Modeling efforts focus on methods for calibration of volumes, pump-down / pressure-up times, and vacuum system configuration considerations. As a result of this systems of linear equations are developed and solved, as well as systems of coupled differential equations which are solved analytically and numerically (when necessary). As a result of this modeling effort a new method has emerged for vacuum processing at discrete pressures and discrete times. Experimental validation is presented in regards to specific applications: MEMS environmentally dependent stiction failure, vapor phase lubrication of MEMS, and XeF2 vapor phase etching of Si.