AVS 57th International Symposium & Exhibition
    Vacuum Technology Tuesday Sessions
       Session VT+MS-TuM

Invited Paper VT+MS-TuM3
Point-of-Use Abatement Devices and Exhaust Management Strategies

Tuesday, October 19, 2010, 8:40 am, Room Laguna

Session: Outgassing, Contamination Control, and Process Modeling
Presenter: M. Sherer, Sherer Consulting Services, Inc.
Correspondent: Click to Email

Semiconductor processes emit various contaminants which require exhaust management and in some cases point-of-use (POU) abatement. It is important to understand process exhaust management strategies, and to select the best, lowest cost-of-ownership POU abatement devices. This presentation will discuss these topics and provide relevant technical information.