| AVS 57th International Symposium & Exhibition | |
| Thin Film | Tuesday Sessions |
| Session TF-TuP |
| Session: | Thin Film Poster Session I |
| Presenter: | J.H. Noh, University of Tennessee |
| Authors: | J.H. Noh, University of Tennessee M. Nikiforov, Oak Ridge National Laboratory S.V. Kalinin, Oak Ridge National Laboratory A.A. Vertegel, Clemson University P.D. Rack, University of Tennessee at Knoxville; Oak Ridge National Laboratory |
| Correspondent: | Click to Email |
The fabrication and electrical and electromechanical characterization of insulated scanning probes have been demonstrated in liquid solutions. The silicon cantilevers were sequentially coated with chromium and silicon dioxide, and the silicon dioxide was selectively etched at tip apex using focused electron beam induced etching (FEBIE) with XeF2 The chromium layer acted not only as the conductive path from the tip, but also as an etch resistant layer . The relevant nanofabrication issues relative to the metallization and the insulator deposition process have been discussed. This insulated scanning probe fabrication process is compatible with any commercial AFM tip and can be used to easily tailor the scanning probe tip properties because FEBIE does not require lithography. The suitability of the fabricated probes is demonstrated and discussed by imaging of standard grid as well as piezoresponse force microscopy (PFM ) and electrical measurements .