AVS 57th International Symposium & Exhibition
    Advanced Surface Engineering Wednesday Sessions
       Session SE+TF-WeA

Paper SE+TF-WeA8
Shadowing Effect of Patterned Seeds in Glancing Angle Deposition

Wednesday, October 20, 2010, 4:20 pm, Room San Miquel

Session: Glancing Angle Deposition (GLAD) II
Presenter: D.-X. Ye, Virginia Commonwealth University
Authors: D. Soma, Virginia Commonwealth University
D.-X. Ye, Virginia Commonwealth University
Correspondent: Click to Email
Glancing angle deposition (GLAD) technique has been developed by several groups including us in the past few years to produce three-dimensional nanostructures of a large variety of material. This technique combines oblique angle deposition with substrate manipulations in a physical vapor deposition system. The shadowing effect is the dominant growth mechanism resulting in the formation of various nanostructure arrays by programming the substrate rotation in polar and/or azimuthal direction. On patterned seeds, the shadowing effect strongly depends on the geometric parameters of the seed arrays, i.e. the aspect ration of individual seeds, and the separation and arrangement of the seeds. In this talk, we will study those geometric parameters using a (2+1)-dimensional Monte Carlo simulation. In our simulation, we couple the shadowing effect and ballistic aggregation with rotating oblique incident particles. The uniformity of the nanostructures grown on the seeds will be investigated. The results of this study will provide a guideline for the design of seeds to achieve uniform size nanostructures by using GLAD.