AVS 57th International Symposium & Exhibition
    Nanometer-scale Science and Technology Wednesday Sessions
       Session NS+EM+EN-WeA

Invited Paper NS+EM+EN-WeA3
Unconventional and Broadband Plasmonics

Wednesday, October 20, 2010, 2:40 pm, Room La Cienega

Session: Photonic and Plasmonic Materials and Devices
Presenter: T.W. Odom, Northwestern University
Correspondent: Click to Email

Breakthroughs in photonics and optoelectronics demand actively controlled materials that are inexpensive, robust, and scalable. The interaction of light with surface plasmons—collective oscillations of free electrons—in metal nanostructures has resulted in exceptional displays of enhanced optical transmission, collimation of light through a subwavelength aperture, and negative permeability and refraction at visible wavelengths. The structures that display these phenomena typically consist of ordered arrays of particles or holes with sizes of the order 100 nm. Surface plasmons can interact with each other over much longer distances, however, and thus the ability to organize nanoscale materials over multiple length scales could lead to new plasmonic metamaterials with novel optical properties.
 
This talk will describe how superlattices and low symmetry plasmonic lattices provide an important first step to meet these goals. We will introduce new soft nanolithography tools for creating new plasmonic structures, including PEEL (a procedure combining Phase-shifting photolithography, Etching, Electron-beam deposition, and Lift-off) and solvent assisted nanoscale embossing (SANE). These methods can achieve arrays of 50-nm features simultaneously over 6-in2 areas without needing electron, ion, or photon-based lithographies. We will then discuss how the optical properties of the plasmonic crystals and the nanoparticle arrays can be engineered and then manipulated by external factors to produce large optical responses.