Paper EW-WeM8
Measure Ion flux to Substrate with Novel OCTIV^TM RF Current-Voltage Probe

Wednesday, October 20, 2010, 10:20 am, Room Southwest Exhibit Hall

The Octiv Single Frequency VI Probe measures the Voltage, Current, Phase, Impedance, Harmonics, Real Power, Forward Power and Reflected Power delivered to a plasma chamber by an RF source. Octiv is a single frequency, inline RF VI Probe. The probe contains an RF VI sensor and high speed data acquisition system, utilising an ultra high-speed digital Fourier Transform for high accuracy measurement of fundamental RF voltage, current and phase.

The Octiv probe is housed in a single, compact enclosure, and is easily installed on all high power RF equipment encountered in the laboratory or industrial environment. A USB connection provides power and data access to the sensor. An adaptor kit can be supplied with the probe to enable connection with standard RF equipment. The Octiv also operates in Pulsed RF plasmas.

Impedans has recently added a unique feature to the Octiv product to allow the capture of the real and imaginary current to an RF biased electrode. In this presentation we will explain how this unique patent pending feature allows the user to measure the ion flux to an RF biased substrate in a processing plasma. The technique works well even when the Substrate is insulating. The ion flux is a key parameter in process control of many plasma processes.