AVS 57th International Symposium & Exhibition
    Energy Frontiers Topical Conference Tuesday Sessions
       Session EN+EM-TuA

Paper EN+EM-TuA3
Engineering LixAlySizO Thin Films as a Solid Electrolyte for 3D Microbatteries

Tuesday, October 19, 2010, 2:40 pm, Room Mesilla

Session: Electronic Materials for Energy Conversion & Storage
Presenter: Y.-C. Perng, UCLA
Authors: Y.-C. Perng, UCLA
J. Cho, UCLA
D. Membreno, UCLA
B. Dunn, UCLA
J.P. Chang, UCLA
Correspondent: Click to Email

The development of secondary lithium-ion batteries has been directed primarily at portable electronics applications. However, these batteries also have the potential to function as a power source for micro-systems through engineering of electrodes into 3D architectures based on high aspect ratio pillars. In order to utilize this potential, an ultra-thin and highly conformal solid electrolyte layer is required to coat the 3D electrode array. The solid electrolyte lithium aluminosilicate (LiAlSiO4), is a promising candidate for this application due to high ionic conductivity along its c-axis resulting from channels formed by the alternating tetrahedra of aluminum-oxygen (Al-O) and silicon-oxygen (Si-O). The length of c-axis of lithium aluminosilicate can be adjusted by changing the crystallization temperature for desired conductivity characteristics.

Atomic layer deposition (ALD) was employed in this work to synthesize thin film lithium aluminosilicate. The self-limiting characteristic of ALD allows for precise control of thickness and composition of complex oxides and results in a highly conformal and pinhole-free coating suitable in 3D micro-battery applications. The metal precursors used in this work are tetraethyl orthosilicate (TEOS), trimethylaluminum (TMA) and lithium t-butoxide (LTB). We also investigated the use of tri-t-butoxy-hydroaluminate (LTBA) but found that the metal composition was difficult to control and high carbon contents. Using the three precursors mentioned above with water vapor as the oxidant, we deposited SiO2, Al2O3 and Li2O, at deposition rates in the range of 0.8~2Å/cycle. The overall deposition rate of stoichiometric LiAlSiO4 was ~5Å/cycle using a chamber base pressure of 10-2 Torr and substrate temperature of 300°C. The concentration of each metal element in LixAlySizO thin films is found to correlate closely to ALD cycles and the associated incubation times. The crystalline structures as well as the local environment of the Li-conducting channels are also affected by the ALD cycles and sequences, as indicated by ultraviolet photoelectron spectroscopy (UPS), transmission electron microscopy (TEM) imaging and nuclear magnetic resonance (NMR) analyses. The Li-ion conductivities of ALD LixAlySizO thin films were determined by impedance measurements using a four-point probe setup with contacts made to the film surface. The films have high ion conductivity and low electronic conductivity, the values of which are strongly influenced by the lithium content and distribution in the synthesized thin films.