AVS 57th International Symposium & Exhibition
    Applied Surface Science Tuesday Sessions
       Session AS-TuM

Paper AS-TuM11
Applications of Hard X-ray Photoelectron Spectroscopy for Characterization of a Hybrid Ti-Si Sol-Gel

Tuesday, October 19, 2010, 11:20 am, Room Cochiti

Session: Electron Spectroscopies
Presenter: J.L. Fenton, The Dow Chemical Company
Authors: J.L. Fenton, The Dow Chemical Company
G. Mitchell, The Dow Chemical Company
Y. Srivastava, The Dow Chemical Company
Y.Q. Rao, The Dow Chemical Company
B. Weaver, The Dow Chemical Company
R. Auger, The Dow Chemical Company
Correspondent: Click to Email
Hard x-ray photoelectron spectroscopy (HAXPS), in particular variable kinetic energy photoelectron spectroscopy (VKE-XPS), is becoming increasingly useful to determine chemical and elemental information from the “bulk” of materials compared to traditional XPS. In addition, VKE-XPS allows for non-destructive depth profiling of materials that pose a greater challenge for Angle-Resolved XPS (ARXPS) such as materials with rough surfaces. This talk will present the application of VKE-XPS to hybrid Ti-Si based sol-gels to understand potential chemical or elemental changes as a function of excitation kinetic energy.