AVS 57th International Symposium & Exhibition
    Applied Surface Science Tuesday Sessions
       Session AS-TuA

Paper AS-TuA2
Advanced Chemical State Analysis Method with Standard Spectra Measured with a Higher Energy Resolution of 0.1 % in Auger Electron Spectroscopy

Tuesday, October 19, 2010, 2:20 pm, Room Cochiti

Session: Advances in Surface and Interface Imaging
Presenter: M. Shima, JEOL Ltd., Japan
Authors: K. Tsutsumi, JEOL Ltd., Japan
M. Shima, JEOL Ltd., Japan
A. Tanaka, JEOL Ltd., Japan
T. Tazawa, JEOL Ltd., Japan
Correspondent: Click to Email

Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) are very famous for elemental and chemical state analysis at a solid surface. In generally, XPS has been utilized for these analysis in an area of more than a few 100 mm2 on a solid surface. In contrast, AES has been used rarely for chemical state analysis, but for elemental analysis at a minute area of less than 100 mm2. The reason for it is approximately caused by the following three problems.
  1. It is difficult to detect any peak shifts between chemical state differences because almost peaks in an AES spectrum are broader than XPS.
  2. It is difficult to measure stably a standard AES spectrum for an insulator sample because a focused electron beam irradiation causes stronger surface charging.
  3. A focused electron beam often makes some elements change to another chemical state.
Among these problems, No.2 and No.3 can be solved in many cases by some special pre-sampling and measurement techniques. However No.1 has been recognized as the biggest problem for the chemical state analysis in AES because some commercial Auger instruments could not obtain sharper peaks in a spectrum with a poor energy resolution of 0.5-0.6 % or the others could not have a sufficient sensitivity with an energy resolution of higher 0.1 %. So, the chemical state analysis in AES has been carried out only for some specific elements showing a bigger chemical shift of more than a few eV.
Now we had measured more than 400 standard spectra by the latest analyzer for pure materials or compounds with the energy resolution of higher than 0.1 %, which included shaper peaks and fine structures with little electron beam damage. Those spectra show that Auger spectra for compounds have different peak shapes and different peak positions.So, it is possible to distinguish them by the peak shape difference, even if some standard spectra of different chemical states have quite similar peak positions each other.
In this report, we can propose an advanced chemical state analysis by higher energy resolution AES, which is a spectrum separation method from a practical spectrum including several chemical states by comparison of peak shape difference. As an example application, this method was applied for the depth profile result of a natural oxide layer on a pure tin oxide plate with an energy resolution of 0.1 %. The result showed that it was clearly consisted of three layers (SnO2/SnO/Sn subst.) by the waveform separation of Sn MNN to each chemical condition of Sn4+, Sn2+, and Sn0. Moreover, it was found that the quantitative analysis of chemical state of Sn was also possible by comparison of the absolute intensity of standard spectrum.