| 2:20pm |
TF2-TuA2
Evaluation of Al2O3 ALD Gas Diffusion Barriers and Visualization of Barrier Defects Using the Ca Test
J.A. Bertrand, S.H. Jen, D. Seghete, S.M. George, University of Colorado, Boulder |
| 2:40pm |
TF2-TuA3
Atomic Layer Deposition of TiO2 on Si (100) and GaAs (100) Surfaces
T. Gougousi, J.W. Lacis, UMBC, J.D. Demaree, ARL |
| 3:00pm |
TF2-TuA4
Self-limiting Deposition of Anatase TiO2 for Photocatalytic Applications
N.G. Kubala, C.A. Wolden, Colorado School of Mines |
| 4:00pm |
TF2-TuA7
In situ X-ray Photoelectron Spectroscopy for the Study of Initial Stages of TiO2 ALD on Silicon
R. Methaapanon, Stanford University |
| 4:20pm |
TF2-TuA8
Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide: Reaction Mechanism Studies using Attenuated Total Reflection Fourier Transform Infrared Spectroscopy
V. Rai, S. Agarwal, Colorado School of Mines |
| 4:40pm |
TF2-TuA9
Molecular Layer Deposition of "Sugarcone" Hybrid Organic-Inorganic Films Using Saccharides and Metal Precursors
B. Yoon, R. Hall, D. Seghete, A.S. Cavanagh, S.M. George, University of Colorado at Boulder |
| 5:00pm |
TF2-TuA10
In-situ Half-Cycle XPS Investigation of La-aluminate Formation during Atomic Layer Deposition
T.J. Park, H.C. Kim, M. Milojevic, B. Lee, R.M. Wallace, J. Kim, University of Texas at Dallas, X. Liu, M. Rousseau, J.H. Li, H. Li, D. Shenai, J. Suydam, Dow Electronic Materials |
| 5:20pm |
TF2-TuA11
Engineering Optical Properties by Controlling Concentration and Proximity of Rare Earth Dopants in an Y2O3 Host using Radical Enhanced ALD
J. Hoang, J. Chang, University of California, Los Angeles |
| 5:40pm |
TF2-TuA12
ALD of La Stabilized Amorphous HfO2 High-k Dielectric Thin Films
T. Wang, J.G. Ekerdt, University of Texas at Austin |