AVS 56th International Symposium & Exhibition | |
Thin Film | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:00pm | TF1-TuA1 Invited Paper First Principles Modeling of Hydrogen Diffusion in Thin Films: Crystalline Alloys, Amorphous Alloys, and Metal Hydrides D. Sholl, S. Hao, L. Semidey-Flecha, C. Ling, S.-G. Kang, Georgia Institute of Technology |
3:00pm | TF1-TuA4 A Family of High Strength Ternary Titanium and Vanadium Nitride Thin Films D.G. Sangiovanni, V. Chirita, L. Hultman, Linkoping University, Sweden |
4:00pm | TF1-TuA7 Study on the Influence of Ballistic and Diffusive Deposition Particles on the Evolution of the Surface Morphology of Thin Films R. Alvarez, P. Romero-Gomez, J. Gil-Rostra, A. Palmero, J. Cotrino, F. Yubero, A.R. Gonzalez-Elipe, CSIC - University of Sevilla, Spain |
4:20pm | TF1-TuA8 DSMC Modeling of E-beam Metal Deposition V. Ayyaswamy, A. Alexeenko, Purdue University |
4:40pm | TF1-TuA9 Electrochemical Capacitance in Cerium Oxide Thin Films and Its Relations to Anionic & Electronic Defects W. Chueh, S. Haile, California Institute of Technology |
5:00pm | TF1-TuA10 Virtual Sputter Chamber - Multiphysics Simulation of Magnetron Sputter & Deposition C. Walton, G. Gilmer, M. McNenly, Lawrence Livermore National Laboratory, J. Verboncoeur, University of California, S. Wilks, L. Zepeda-Ruiz, T.W. Barbee, Lawrence Livermore National Laboratory |
5:20pm | TF1-TuA11 Tuning Knobs for the Morphology and Dewetting of a Bimodal Molecular System J. Topple, McGill University, Canada, S. Burke, UC Berkeley, S. Fostner, P. Grutter, McGill University, Canada |