AVS 56th International Symposium & Exhibition
    Applied Surface Science Monday Sessions

Session AS+EM+MS+TF-MoM
Spectroscopic Ellipsometry I

Monday, November 9, 2009, 8:20 am, Room C2
Moderator: M.S. Wagner, Proctor and Gamble


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Click a paper to see the details. Presenters are shown in bold type.

8:20am AS+EM+MS+TF-MoM1
Optical Properties of Bulk GaSe and InSe Single Crystals
S.G. Choi, National Renewable Energy Laboratory, C. Martinez-Tomas, V. Munoz Sanjose, Universitat de Valencia, Spain, D.H. Levi, National Renewable Energy Laboratory
8:40am AS+EM+MS+TF-MoM2
Ellipsometric Porosimetry for the Microstructure Characterization of Plasma-Deposited SiO2-Like Films
M. Creatore, N.M. Terlinden, G. Aresta, M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands
9:00am AS+EM+MS+TF-MoM3 Invited Paper
Industrial Applications of Spectroscopic Ellipsometry
J.A. Woollam, J.A. Woollam Company, Inc., J.N. Hilfiker, P. He, J.A. Woollam Company Inc.
9:40am AS+EM+MS+TF-MoM5
Spectroscopic Ellipsometry Studies of Sputtered Vanadium Oxide Thin Films
N.J. Podraza, B.D. Gauntt, M.A. Motyka, E.C. Dickey, M.W. Horn, The Pennsylvania State University
10:00am AS+EM+MS+TF-MoM6
Real Time Spectroscopic Ellipsometry Studies of Si:H and Ge:H Thin Films for Microbolometer Applications
D. Saint John, E.C. Dickey, N.J. Podraza, The Pennsylvania State University
10:40am AS+EM+MS+TF-MoM8
Non-destructive Determination of Spatial Distributions of Free-Charge-Carriers in Low Doped Semiconductors using THz Ellipsometry
T. Hofmann, University of Nebraska-Lincoln, C.M. Herzinger, J. A. Woollam Co. Inc., M. Schubert, University of Nebraska - Lincoln
11:00am AS+EM+MS+TF-MoM9
Ellipsometric Depth Profiling of Polymer-Blend Films for Organic Electronics and Photovoltaics
L.J. Richter, D.S. Germack, D.M. DeLongchamp, D.A. Fischer, V.M. Prabhu, D.J. Gundlach, National Institute of Standards and Technology, J.E. Anthony, University of Kentucky, N. Shin, D. Yoon, Seoul National University, Korea
11:20am AS+EM+MS+TF-MoM10
Thickness Variations Determined by Spectroscopic Ellipsometry in Organometallic Chemical Vapor Deposition: Connection to Growth Processes
X. Liu, D.E. Aspnes, North Carolina State University
11:40am AS+EM+MS+TF-MoM11
Optical Anisotropy Induced by Oblique Incidence Ion Bombardment of Ag(001)
H. Wormeester, F. Everts, B. Poelsema, University of Twente, The Netherlands