AVS 56th International Symposium & Exhibition
    Vacuum Technology Tuesday Sessions
       Session VT-TuP

Paper VT-TuP13
Outgassing Measurement of Ion and Getter Pumps at UHV Regime

Tuesday, November 10, 2009, 6:00 pm, Room Hall 3

Session: Vacuum Technology Posters and Student-Built Vacuum Systems Poster Competition
Presenter: G.Y. Hsiung, NSRRC, Taiwan
Authors: G.Y. Hsiung, NSRRC, Taiwan
C.M. Cheng, NSRRC, Taiwan
J.R. Chen, NSRRC and NTHU, Taiwan
Correspondent: Click to Email
The combination of ion pumps and getter pumps have been used for the advanced pumping at UHV regime of a pressure below 10 nPa. The effective pumping speed of ion and getter pumps is limited at UHV pressure due to the outgas of the materials inside the pumps such as H2 and CO or that evolved from the surface reactions during or after pumping such as CH4. Besides, the outgas of the noble gas such as He or Ar buried inside the cells of ion pumps as well as the Kr or Ar from the coated film of getter pumps is regarded as one of promising limit of pumping speed. The measurement of outgas of ion and getter pumps is performed by pressure build up method. The cleaning process for reduction of the outgas of the ion and getter pumps are evaluated.