AVS 56th International Symposium & Exhibition | |
Thin Film | Monday Sessions |
Session TF1-MoM |
Session: | Thin Films: Growth and Characterization I |
Presenter: | O.M. Ntwaeaborwa, University of the Free State, South Africa |
Authors: | O.M. Ntwaeaborwa, University of the Free State, South Africa P.D. Nsimama, University of the Free State, South Africa H.C. Swart, University of the Free State, South Africa |
Correspondent: | Click to Email |
Thin films of SrAl2O4:Eu2+,Dy3+ phosphor were grown on silicon substrates using a 248 nm KrF pulsed laser to evaluate the effects of different processing parameters on photoluminescence properties of the phosphor. The processing parameters which were varied during the films growth include temperature, pressure, and the number of pulses. X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used to examine the structure, particle morphology and surface topography of the films. The chemical composition and thicknesses of the films were determined by Rutherford backscattering spectroscopy (RBS). Photoluminescence spectra of the films recorded by the Cary Eclipse spectrophotometer were characterized by major green phosphorescent emission with a maximum at ~520 nm and minor red emission with a maximum at 630 nm. The green and red photoluminescence at 520 and 630 nm are associated with the 4f65d→4f7(8S7/2) and 5D0-7F2 transitions of Eu2+ and residual Eu3+ ions respectively. The effects of processing parameters on the PL intensity and the possible mechanism of the green phosphorescence were discussed.