AVS 56th International Symposium & Exhibition | |
Thin Film | Wednesday Sessions |
Session TF-WeM |
Session: | Nanostructuring Thin Films I |
Presenter: | N.O. Hartmann, University of Duisburg-Essen, Germany |
Authors: | N.O. Hartmann, University of Duisburg-Essen, Germany S. Franzka, University of Duisburg-Essen, Germany M. Mathieu, University of Duisburg-Essen, Germany J. Koch, Laser Zentrum Hannover, Germany B.N. Chichkov, Laser Zentrum Hannover, Germany A. Ostendorf, Ruhr-Universität Bochum, Germany |
Correspondent: | Click to Email |
In the last decade, surface processing with ultra-short laser pulses has emerged as a powerful tool for nanofabrication. Here, fs-laser patterning of self-assembled organic monolayers offers a variety of particularly promising perspectives. The ultrathin nature of these coatings allows for single pulse processing and hence ensures short processing times. It also allows for well-defined irradiation and burr-free patterning of the coating and avoids bubble and particle formation. All off which are problems usually encountered in fs-laser processing. Moreover, varying the chemical structure of the monolayer provides a means to tailor cross sections, incubation effects and resist properties and to enable chemical nanopatterning. Surprisingly, despite these promising perspectives, fs-laser processing of organic monolayers still is largely unexplored. In a recent study we investigated fs-laser patterning of alkylsiloxane monolayers on quartz glass substrates at λ=800 nm and pulse lengths below 30 fs [1]. Selective decomposition of the coating with single laser pulses at subwavelength resolution can be carried out over a wide range of fluences from 4.2 down to 3.1 J/cm2. In particular, at a 1/e laser spot diameter of 1.8 μm, structures with a width down to 250 nm and below were fabricated. Very similar results were also obtained from multiple pulse patterning experiments suggesting that incubation effects are negligible. Hence precise fabrication of complex patterns appears feasible. This opens up a facile route towards laser fabrication of transparent templates with chemical structures down into the sub 100 nm regime. Such templates represent promising platforms for biotechnological applications, e. g. biosensor arrays. Processing at higher fluences, also provides a facile route towards combined chemical/topographic structures, e. g. for microfluidic applications. With a band gap of 9 eV, quartz glass, of course, represents an ideal platform for nonlinear fs-laser processing via multiphoton absorption processes. Further results, though, demonstrate that fs-laser processing also allows for subwavelength patterning of organic monolayers on thin gold films. A general account on recent achievements in nonlinear laser patterning of organic monolayers via multiphoton absorption and photothermal processes is given.[1] N. Hartmann, S. Franzka, J. Koch, A. Ostendorf und B. N. Chichkov, Appl. Phys. Lett. 92 (2008) 223111.