| AVS 56th International Symposium & Exhibition | |
| Thin Film | Thursday Sessions |
| Session TF-ThP |
| Session: | Aspects of Thin Films Poster Session |
| Presenter: | B.A. Sperling, National Institute of Standards and Technology |
| Authors: | B.A. Sperling, National Institute of Standards and Technology J.E. Maslar, National Institute of Standards and Technology W.A. Kimes, National Institute of Standards and Technology D.R. Burgess, Jr., National Institute of Standards and Technology E.F. Moore, National Institute of Standards and Technology |
| Correspondent: | Click to Email |
In situ monitoring of atomic layer deposition (ALD) could potentially make process optimization faster and more cost-efficient. Additionally, it permits computational models for chemistry and fluid dynamics to be tested and refined; these validated models, in turn, could also be useful tools for process development and equipment design. We have been developing real-time diagnostics for gas-phase concentrations using a number of methods including mass spectroscopy, distributed-feedback diode laser absorption spectroscopy, and quantum cascade laser absorption spectroscopy. This work focuses on our work with time-resolved Fourier transform infrared (FTIR) spectroscopy, which we use to monitor gas-phase species during ALD of hafnium oxide from tetrakis(ethylmethylamino) hafnium and water. Results are compared to other measurement techniques applied to the same warm-walled, single-wafer reactor. Additionally, our efforts to model the system using computational fluid dynamics and a detailed kinetic reaction mechanism are discussed.