AVS 56th International Symposium & Exhibition
    Surface Science Tuesday Sessions
       Session SS-TuP

Paper SS-TuP19
Effect of Rapid Thermal Annealing on the Electrical and Optical Properties of Reactively Sputtered Ag2O Thin Films

Tuesday, November 10, 2009, 6:00 pm, Room Hall 3

Session: Surface Science Poster Session I and Mort Traum Finalists
Presenter: C.C. Tseng, National Chung Hsing University, Taiwan
Authors: C.C. Tseng, National Chung Hsing University, Taiwan
J.H. Hsieh, Ming Chi University of Technology, Taiwan
W. Wu, National Chung Hsing University, Taiwan
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Silver oxide films were deposited on glass substrates by magnetron sputtering of a silver target in various Ar–O2 reactive mixtures with deposited temperature. After deposition, some of these films were annealed using a rapid thermal annealing (RTA) system, with the variation of temperature. A UV-VIS-NIR photometer and a Hall measurement system were used to characterize the optical and electrical properties of these films. The films show a systematic changed from Ag2O(hexagonal) phase to Ag+Ag2O(cubic) phases at various annealing temperatures. When the annealing temperature is higher than 300oC, the Ag2O(hexagonal) phase transformed to Ag+Ag2O(cubic) composite phases. Accordingly, the band gap of these films will change, along with the optical and electrical properties.
 
Keywords: silver oxide, UV-VIS, rapid thermal annealing, optical property, electrical property.