| AVS 56th International Symposium & Exhibition | |
| Advanced Surface Engineering | Tuesday Sessions |
| Session SE-TuP |
| Session: | Advanced Surface Engineering Poster Session |
| Presenter: | K.M.A. Sobahan, Inha University, Republic of Korea |
| Authors: | K.M.A. Sobahan, Inha University, Republic of Korea Y.J. Park, Inha University, Republic of Korea C.K. Hwangbo, Inha University, Republic of Korea |
| Correspondent: | Click to Email |
Glancing angle deposition (GLAD) is a physical evaporation technique widely used to fabricate nanostructured thin-films materials with controllable shapes and porosity, which is achieved by a self-shadowing effect and surface diffusion. By taking advantage of the versatility of the GLAD technique, it is possible to engineer the materials with unique properties for added value in such areas as optical thin films or nanoporous coatings, high-speed gas sensors, and chemical devices. GLAD thin films can also serve as the foundation of many different types of nano and micro devices.
In this communication, we report the nanostructured porous SiO2 thin films fabricated by modified GLAD technique. The optical properties of the SiO2 films fabricated in this technique are investigated and as an application, the antireflection coating (AR) for visible wavelength is designed and fabricated. It is seen that the average reflectance of the AR coating is below 0.04%. The microstructures and the surface morphology are also investigated by using a scanning electron microscope (SEM).