AVS 56th International Symposium & Exhibition
    Nanometer-scale Science and Technology Tuesday Sessions
       Session NS2-TuA

Paper NS2-TuA8
Assembly of Block Copolymer Micelles on a Lithographically Modified Surface

Tuesday, November 10, 2009, 4:20 pm, Room L

Session: Templated Self-Assembly
Presenter: A. Pearson, Brigham Young University
Authors: A. Pearson, Brigham Young University
R.C. Davis, Brigham Young University
Correspondent: Click to Email
Block copolymer self-assembly is a promising method of creating ordered arrays with feature sizes smaller than possible by conventional lithography techniques. Block copolymer micelle patterning has proven to be a versatile method of creating hexagonal arrays of metal nanoparticles with sizes less that 10 nm and spacing that can be adjusted by changing the molecular weight of the block copolymer used. In order to use these nanoparticles for many lithographic applications, registration of the nanoparticles with other surface patterns is essential. Here we exploit the self-aligned assembly of PS-P2VP block copolymer micelles with both topographical and chemical surface patterns to achieve micelle registration. Specifically e-beam lithography and plasma etching of SiO2 surfaces was used to create recessed boxes and ovals where controlled numbers of micelles were deposited by dip coating. Chemical patterning was used to selectively place micelles in the recessed patterns with low micelle adsorption in the non-recessed regions. Gold nanoparticles were formed from the micelles by adding HAuCl4 to the micelles in solution prior to deposition. After dip coating , an oxygen plasma etch removes the polymer, leaving gold nanoparticles. Scanning electron and atomic force microscopy were used to measure nanoparticle alignment.