| AVS 56th International Symposium & Exhibition | |
| Graphene Topical Conference | Monday Sessions |
| Session GR-MoM |
| Session: | Graphene and 2D Carbon Nanostructures |
| Presenter: | S.G. Walton, Naval Research Laboratory |
| Authors: | S.G. Walton, Naval Research Laboratory M. Baraket, Naval Research Laboratory E.H. Lock, Naval Research Laboratory |
| Correspondent: | Click to Email |
Graphene and graphene oxide have attracted widespread interest because of their unique structural and electronic properties, which lend themselves well to the production of nanoscale electronic and sensing devices. Indeed, graphene is a single monolayer thick carbon sheet with remarkably high electron mobility. The addition of oxygen increases the sheet thickness and decreases this mobility and, more interestingly, determines both the conducting and reactive properties of the material. One significant impediment to realizing the potential of graphene oxide is the development of an industrially viable approach to producing large area substrates of well-controlled oxygen concentration. In this respect, plasmas are an ideal candidate but problems associated with the large fluxes of energetic ions are a significant concern. The Naval Research Laboratory has developed a plasma processing system that is characterized by a uniquely low incident ion energy, in the range of a few eV, at or near the carbon-carbon and carbon-oxygen bond strength. We discuss the use of this system to reduce the oxygen concentration of graphene oxide. We examine the plasma processing conditions, plasma characteristics, and the resulting properties of the material in an effort to understand reduction mechanisms. This work was supported by the Office of Naval Research.