| AVS 56th International Symposium & Exhibition | |
| Applied Surface Science | Tuesday Sessions |
| Session AS-TuP |
| Session: | Applied Surface Science Poster Session |
| Presenter: | M, Kanda, Kyoto University, Japan |
| Authors: | M, Kanda, Kyoto University, Japan T. Ichii, Kyoto University, Japan K. Murase, Kyoto University, Japan H. Sugimura, Kyoto University, Japan |
| Correspondent: | Click to Email |
In this study, a well-aligned array of gold nanodots was fabricated using SPL. A Si(111) surfaces covered with self-assembled monolayers (SAM) of 1-hexadecene (HD) were used as substrates. HD-SAMs have high chemical durability to hydrofluoric acid (HF) and were used as resist film of SPL. Nanoscale patterns of silicon oxides were fabricated by applying DC bias voltages between an AFM probe and the substrate. Since the HD-SAMs had a highly ordered structure and only 2.3 nm thicknesses, the size and the position of the oxides were precisely controlled. Then, the oxides were etched by immersing the samples into HF solution, and the underlying Si surfaces on the nanopatterns were exposed. After the HF etching, the samples were immersed into an Au electroless plating solution and gold nanodots were deposited only on the nanopatterns. The structures and the optical properties of the gold nanodots arrays were investigated by field emission scanning electron microscopy (FE-SEM) and spectrophotometer, respectively.