| AVS 56th International Symposium & Exhibition | |
| Applied Surface Science | Monday Sessions |
| Session AS+EM+MS+TF-MoA |
| Session: | Spectroscopic Ellipsometry II |
| Presenter: | F.K. Urban, Florida International University |
| Authors: | F.K. Urban, Florida International University D. Barton, Florida International University T.E. Tiwald, J A Woollam Co. |
| Correspondent: | Click to Email |
A major challenge for those utilizing ellipsometry is numerical processing of the measured data. The transcendental, multivalued equations arising from the physics of simple reflection are problematic for the least-squares numerical methods in common use. These early numerical methods require fairly accurate initial estimates, bounding to avoid local minima, and only find solutions at the bottom of a relatively flat numerical topography. Previously we have applied Complex Analysis in the n-k plane to improve visualization of the mathematics and this has led to a growing array of new numerical methods avoiding these difficulties. The work presented here extends these new numerical methods for use beyond transparent substrates to include absorbing substrates. Results show that reflection ellipsometry alone can be sufficient for determination of thin absorbing film thickness and optical properties without the need for additional kinds of measurements.
Numerical processing considering surface layers such as air-formed oxides will also be presented.