| AVS 53rd International Symposium | |
| Thin Film | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF+SS-TuA1 Invited Paper Surface Functionalization for Selective Area ALD R. Chen, J. Hong, S.F. Bent, Stanford University |
| 2:40pm | TF+SS-TuA3 Surface Mechanisms in Oxygen-Based Noble Metal Atomic Layer Deposition K.J. Park, S.M. Stewart, G.N. Parsons, North Carolina State University |
| 3:00pm | TF+SS-TuA4 Invited Paper Atomic Layer Deposition of Hafnium Silicate Gate Dielectric Layers A. Delabie, G. Pourtois, M. Caymax, S. De Gendt, L.-A. Ragnarsson, M.M. Heyns, IMEC, Belgium, Y. Fedorenko, J. Swerts, J.M. Maes, ASM Belgium |
| 3:40pm | TF+SS-TuA6 Mechanistic Details of TiN Atomic Layer Deposition (ALD) Processes H. Tiznado, F. Zaera, University of California, Riverside |
| 4:00pm | TF+SS-TuA7 Invited Paper Surface Processes of Plasma-Assisted Atomic Layer Deposition W.M.M. Kessels, Eindhoven University of Technology, The Netherlands |