| AVS 53rd International Symposium | |
| Advanced Surface Engineering | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 3:40pm | SE2-WeA6 In-Situ Ellipsometric Studies of HPPMS Deposited Chromium Thin Films S.L. Rohde, J. Li, S.R. Kirkpatrick, University of Nebraska-Lincoln |
| 4:00pm | SE2-WeA7 Plasma Spectroscopy of Carbon Nanotubes J.G. Jones, C. Muratore, A.R. Waite, A.A. Voevodin, AFRL/MLBT |
| 4:20pm | SE2-WeA8 Pulsed RF PECVD of a-SiN@sub x@:H Alloys: Film Properties, Growth Mechanism and Applications R. Vernhes, O. Zabeida, J.E. Klemberg-Sapieha, L. Martinu, Ecole Polytechnique of Montreal, Canada |
| 4:40pm | SE2-WeA9 The Role of Oxygen Impurities in Anisotropic Etching of Crystalline Silicon by Atomic Hydrogen, and in the Deposition of Single-Phase Nanocrystalline Silicon S. Veprek, Technical University Munich, Germany, Ch.L. Wang, Consultant, M.G.J. Veprek-Heijman, Technical University Munich, Germany |