AVS 53rd International Symposium
    Surface Science Thursday Sessions
       Session SS2+NS+TF-ThA

Paper SS2+NS+TF-ThA9
Assessing nanomechanical properties and nanoscratch resistance of Me-ZrN and ZrN thin films using Atomic Force Microscope

Thursday, November 16, 2006, 4:40 pm, Room 2004

Session: Tribology
Presenter: D.M. Mihut, University of Nebraska-Lincoln
Authors: D.M. Mihut, University of Nebraska-Lincoln
J. Li, University of Nebraska-Lincoln
S.R. Kirkpatrick, University of Nebraska-Lincoln
S. Aouadi, Southern Illinois University
S.L. Rohde, University of Nebraska-Lincoln
Correspondent: Click to Email
The present study aims at getting a better understanding of the correlation between nanomechanical properties (nanohardness (H), elastic modulus (E), H/E and H3/E2 ratio) and nanotribological properties (resulting from nanoscratch measurements) for three groups of Me-ZrN thin films (Inconel-ZrN, Cr-ZrN and Nb-ZrN) and ZrN thin films. Nanomechanical and nanotribological properties for Me-ZrN and ZrN thin films deposited by DC unbalanced magnetron sputtering were investigated using atomic force microscope (AFM) interfaced with a Hysitron Triboscope. The elastic recovery of thin films under a normal load applied during nanoindentation was evaluated and correlated with elastic recovery of thin films under a dynamic load applied during nanoscratch measurements and with other mechanical properties in order to predict the thin film composition that will better serve for wear resistant applications.