AVS 53rd International Symposium
    Surface Science Tuesday Sessions
       Session SS1-TuM

Paper SS1-TuM1
Thermal Stability of Metallic Nano-Clusters and Film Patterning on Solid Surfaces Studied Via Weakly Bound Buffer Layer

Tuesday, November 14, 2006, 8:00 am, Room 2002

Session: Reactivity of Metal Clusters
Presenter: M. Asscher, Hebrew University, Israel
Correspondent: Click to Email

Growth of metallic nano-clusters and control over their size are critically important for catalysis. Development of film patterning at the nanometer scale has significant impact on future lithography. In this work we combine a method to deposit metallic nano-clusters using weakly bound buffer layer as an intermediate substance to control the clusters size with laser patterning that modulates their surface density. Using optical probes, the size selected diffusion of gold nano-clusters on metallic and oxygen modified surfaces has been studied. Information on clusters mobility is critical for understanding and control the thermal stability of clusters toward the development of sintering resistant catalysts. The same technique was further developed at thicker film thickness to pattern the layer at the sub-micron to nanometer scale employing a single laser pulse. This technique is discussed as a novel approach for lithography.