AVS 53rd International Symposium
    Surface Science Tuesday Sessions
       Session SS-TuP

Paper SS-TuP23
Quantitative Analysis of SAM-Layers on Copper

Tuesday, November 14, 2006, 6:00 pm, Room 3rd Floor Lobby

Session: Surface Science Poster Session
Presenter: C. Van der Marel, Philips Research, The Netherlands
Authors: C. Van der Marel, Philips Research, The Netherlands
Y. Furukawa, Philips Research, The Netherlands
N. Kahya, Philips Research, The Netherlands
J.H.M. Snijders, Philips Research, The Netherlands
Correspondent: Click to Email
Recently, a method has been developed for the quantitative analysis of XPS-measurements on homogeneous layer systems.@footnote 1@ Starting from the apparent concentrations, measured at only one take-off angle, the method provides values for the composition and the thickness of all layers present in the system in a self-consistent way. The method works well for homogeneous layer systems (e.g. samples consisting of a Self Assembling Monolayer (SAM) on a substrate), provided that for each element or chemical state is known to which layer it belongs. Measurements at two or more different angles provide in general information about the depth-distribution of an element or a chemical state in a sample. The present calculation method has been extended to include measurements at two or three measuring angles; by doing so also the depth-distribution of the elements is obtained in a quantitative way. The method will be illustrated by experiments with various SAM-layers on copper. The Cu2p- and the Cu LMM lines were used to obtain information about the chemical state of copper. The copper surfaces were precleaned by means of ion etching in the XPS instrument and incubated with the appropriate SAM-layer without contact with the ambient air. @FootnoteText@ @footnote 1@ C. van der Marel, M. Yildirim and H. Stapert, J. Vac. Sci. Technol. A23 (2005) 1456 - 1470.