AVS 53rd International Symposium
    Surface Science Tuesday Sessions
       Session SS-TuP

Paper SS-TuP17
Thermal and Non-Thermal Decomposition of Diethylamine on Si(100)

Tuesday, November 14, 2006, 6:00 pm, Room 3rd Floor Lobby

Session: Surface Science Poster Session
Presenter: S. Yeninas, Bradley University
Authors: S. Yeninas, Bradley University
A. Brickman, Bradley University
J.H. Craig, Jr., Bradley University
J. Lozano, Bradley University
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Electron stimulated desorption (ESD), temperature programmed desorption (TPD), x-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), and high resolution electron energy loss spectroscopy (HREELS) were used to investigate the decomposition of diethylamine (DEA) on Si(100) surfaces. Adsorption of DEA on the silicon surface was studied by XPS and UPS. Changes in the valence band structure of silicon due to adsorption of DEA will be discussed. HREELS and TPD show carbon is thermally removed from the surface with the ethyl groups via a beta-hydride elimination process. TPD provides evidence that ethylene thermally desorbs from the substrate from two adsorbate states (at 560K and 760K) while methyl groups are desorb from only one state (560K). Non-thermal decomposition of DEA was studied by irradiating the surface with 600-eV electrons at 100K. TPD and HREELS data indicates decomposition of the parent molecule upon irradiation. After electron irradiation, TPD shows desorption of ethyl groups from only one adsorbate state. XPS data showed deposition of carbon and nitrogen and possible formation of nitrides and carbides on the surface after electron irradiation that could not be thermally removed.