AVS 53rd International Symposium
    Surface Science Thursday Sessions
       Session SS-ThP

Paper SS-ThP6
Comparison of the Sputter Rates of Fe@sub 2@O@sub 3@, Cr@sub 2@O@sub 3@, CeO@sub 2@, ZnO, and TiO@sub 2@, Films to the Sputter Rate of SiO@sub 2@

Thursday, November 16, 2006, 5:30 pm, Room 3rd Floor Lobby

Session: Surface Science Poster Session
Presenter: M.H. Engelhard, Pacific Northwest National Laboratory
Authors: M.H. Engelhard, Pacific Northwest National Laboratory
D.R. Baer, Pacific Northwest National Laboratory
T. Droubay, Pacific Northwest National Laboratory
A.S. Lea, Pacific Northwest National Laboratory
P. Nachimuthu, Pacific Northwest National Laboratory
Correspondent: Click to Email
Because of the increasing technological importance of oxide films for a variety of applications, there is a growing interest in knowing the sputter rates for oxides relative to the sputter rate for SiO@sub 2@, a common sputter rate reference material. To support our research programs, we have made a series of measurements of the sputter rates for oxide films that have been grown by oxygen plasma assisted molecular beam epitaxy (OPA-MBE) or pulsed laser deposition (PLD). The film thicknesses and densities of these films were measured using x-ray reflectivity (XRR). These samples were mounted in a Phi Quantum 2000 where x-ray photoelectron spectroscopy (XPS) was used to monitor composition during sputtering using a 2 keV Ar@super +@ ion beam 45° from surface normal. We find that the sputter rates of Fe@sub 2@O@sub 3@, Cr@sub 2@O@sub 3@, and CeO@sub 2@, are all significantly slower than what is observed for SiO@sub 2@. In addition to the observed sputter rates, the XPS measurements allow observation of ion beam induced reduction of the oxides. Sputter rate measurements of both anatase and rutile forms of TiO@sub 2@, and ZnO will also be reported.