AVS 53rd International Symposium
    Surface Science Thursday Sessions
       Session SS-ThP

Paper SS-ThP11
Noncontact Atomic Force Microscopic Studies on Atomic Scale Structures of TiO@sub 2@ Single Crystal Surfaces Prepared by Wet Chemical Process

Thursday, November 16, 2006, 5:30 pm, Room 3rd Floor Lobby

Session: Surface Science Poster Session
Presenter: Y. Namai, Mitsui Chemicals, Inc., Japan
Authors: Y. Namai, Mitsui Chemicals, Inc., Japan
S. Miyazoe, Mitsui Chemicals, Inc., Japan
O. Matsuoka, Mitsui Chemicals, Inc., Japan
Correspondent: Click to Email
We succeeded in observing the atomic scale structures of rutile-type TiO@sub 2@ surfaces prepared by the wet chemical method of chemical etching in an acid solution (H@sub 2@SO@sub 4@+H@sub 2@O@sub 2@) and surface annealing at 873 K in air. We tried to perform noncontact AFM observations at 450 K, which is above a desorption temperature of molecularly adsorbed water on the TiO@sub 2@(110) surface, and could obtain the atomic scale structure of the TiO@sub 2@(110) surface prepared by the wet chemical method. The surface structure was consistent with the (1 x 1) bulk-terminated model of TiO@sub 2@(110) surface. In the noncontact AFM measurements at room temperature, however, the atomic scale structure of the TiO@sub 2@(110) surface was not observed. The TiO@sub 2@(110) surface may be covered with molecularly adsorbed water after the surface was prepared by the wet chemical method. We consider that the wet chemical method is an important method in preparing atomic scale structures of TiO@sub 2@ surfaces under atomospheric conditions.