The Glancing Angle Deposition (GLAD) process has been the subject of considerable study over the last 10 years, and significant improvements in the quality of and control over film nanostructure have been demonstrated. This presentation will report two of the recent developments that have extended the range of materials deposited and have provided new architectures with promising applications. First, using GLAD in conjunction with an advanced substrate motion algorithm called PhiSweep, we have been able to tune the column diameter of vertical post microstructures from the typical 200nm width to values as small as 20nm, demonstrated in both Si and Ti films. This control is enabled by a periodic sweep of the substrate about the desired orientation, in a manner that defeats the tendency of a growing column to broaden. An application of such films to microfluidics will be demonstrated. Second, we have recently used e-beam evaporation and the GLAD process for deposition of organic tris-(8-hydroxyquinoline) aluminum (Alq3) with chiral and post nanostructures. The films produced show helices arranged in a near periodic self organized array over the substrate, and also display a remarkable structural uniformity. Alq3 is commonly used as an organic luminescent material, thus characterization of the luminescent and optical properties will be reported.