AVS 53rd International Symposium
    Advanced Surface Engineering Thursday Sessions
       Session SE-ThA

Paper SE-ThA6
Preparation and Characterization of Reactively Sputtered Al@sub x@CoCrCuFeNi Oxide Films

Thursday, November 16, 2006, 3:40 pm, Room 2007

Session: Hard and Nanocomposite Coatings: Synthesis, Structure, and Properties
Presenter: T.K. Chen, National Dong Hwa University, Taiwan, ROC
Authors: T.K. Chen, National Dong Hwa University, Taiwan, ROC
M.S. Wong, National Dong Hwa University, Taiwan, ROC
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Multicomponent Al@sub x@CoCrCuFeNi (x=0.5, 1 and 2) metallic and oxide thin films were prepared by reactive sputtering using single alloy target in a mixture of argon and oxygen gases with various oxygen/argon flow ratio. The dependence of the oxygen to argon ratio, such as the evolution of films structure and properties was investigated in this study. At low oxygen flow rate, the oxygen atoms seemed to be incorporated into the metallic films as solute atoms. At higher oxygen to argon fraction, new crystalline oxide phases, matching the XRD patterns of spinel-structured AB@sub 2@O@sub 4@ like NiCr@sub 2@O@sub 4@ were detected. The films resistivity increased from hundreds of micron ohm-cm for metallic films to nearly 1000 ohm-cm for oxide films grown at high oxygen/argon ratio. UV-Vis absorption spectra of the oxide films revealed a narrow transmission band that only light with wavelength between 650 nm to 850 nm was allowed to pass. These oxide films exhibited unexpected high hardness, compared with their metal and metal nitride counterparts, to a value of 20 GPa.