AVS 52nd International Symposium | |
Thin Films | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:20am | TF-ThM1 Refractive Index Control of Sputtered Multicomponent Bismuthate Glass Films for Bi-EDWA J. Kageyama, Y. Kondo, M. Ono, N. Sugimoto, Asahi Glass Co., Ltd., Japan |
8:40am | TF-ThM2 Controlled Doping and Photoluminescence Properties of Er-doped Yttrium Oxide Thin Films T.T. Van, University of California, Los Angeles, J. Bargar, Stanford Synchrotron Radiation Laboratory, R. Ostroumov, K. Wang, J.P. Chang, University of California, Los Angeles |
9:00am | TF-ThM3 Alternating Current Thin Film Electroluminescence (ACTFEL) from Zinc Sulfide Doped with Rare Earth Fluorides D.M. DeVito, A.A. Argun, M.R. Davidson, P.H. Holloway, University of Florida |
9:20am | TF-ThM4 Custom-design of Optical Thin Films of Silicon Oxide by Direct Write Deposition H.D. Wanzenboeck, M. Fischer, E. Bertagnolli, Vienna University of Technology, Austria |
9:40am | TF-ThM5 Invited Paper Vacuum-Deposited Form-Birefringent Materials for Use as Retarders and Polarizers I.J. Hodgkinson, University of Otago, New Zealand |
10:20am | TF-ThM7 Invited Paper Birefringent Films for Contrast Enhancement of LCoS Projection Systems K.D. Hendrix, M. Duelli, D.M. Shemo, K.L. Tan, JDS Uniphase |
11:00am | TF-ThM9 Invited Paper New Imaging Ellipsometric Techniques for Thin Film Dielectric Tensor Measurement R.A. Chipman, University of Arizona |
11:40am | TF-ThM11 Thin Film Optical Constants in the EUV using Simultaneous Reflection and Transmission Measurements D.D. Allred, G.A. Acosta, R.S. Turley, J.E. Johnson, Brigham Young University, K.R. Adamson, Harvard University, N. Farnsworth, Brigham Young University |