| AVS 52nd International Symposium | |
| Thin Films | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF+EM-ThA1 Invited Paper Transparent Conducting Oxides J.C.C. Fan, Kopin Corporation |
| 3:00pm | TF+EM-ThA4 Study on Initial Growth Process of Transparent Conductive Oxide Films Deposited by dc Magnetron Sputtering Y. Sato, M. Taketomo, A. Miyamura, Y. Shigesato, Aoyama Gakuin University, Japan |
| 3:20pm | TF+EM-ThA5 Transparent Conducting Oxide Deposition using Closed Field Reactive Magnetron Sputtering J.M. Walls, D.R. Gibson, I. Brinkley, E.M. Waddell, Applied Multilayers Ltd, UK |
| 3:40pm | TF+EM-ThA6 Effect of Dendrimer Underlayers on Sputtered Indium-Tin Oxide Thin Film Microstructure, Morphology, Optical and Electrical Properties R. Thunuguntla, S. Gupta, S. Street, The University of Alabama, D. Loy, The Army/ASUFlexible Display Center |
| 4:00pm | TF+EM-ThA7 Invited Paper Ferromagnetic Behavior in Indium Oxide Based Transparent Semiconductors J. Moodera, Massachusetts Institute of Technology |