The semiconductor industry has for years been held up as an example of a "clean", progressive, and environmentally friendly industry. To maintain this image and to ensure the long-term sustainability of the industry, SEMATECH, the R&D consortium of the major chip manufacturers, has diligently worked for many years on resource conservation including energy, water and chemical reduction. This paper will discuss the ideas that the industry has successfully implemented or is studying in each of these areas. Energy reductions have been achieved through HEPA velocity and tool exhaust reduction, and optimization of onsite nitrogen generation and use. The current focus is on improving tool heat dissipation and tool idle energy use. Similarly, recognizing that the industry uses significant amounts of water for wafer etching, rinsing and chemical mechanical planarization (CMP), SEMATECH has focused on ultra pure water (UPW) recycle, optimization of wafer rinse processes and non-process water use in CMP. More recent efforts have centered on improved CMP slurry utilization and reduction of consumables such as pads and post-CMP clean brushes. In the chemicals arena, the industry is working closely with regulatory agencies globally to reduce emissions of undesirable chemicals such as perfluorocompounds (PFCs) and perfluorooctane sulfonates (PFOS). In addition, SEMATECH and the World Semiconductor Council (WSC) have emphasized the need for more comprehensive and timely access to environment, safety and health (ESH) data for the many new chemicals being introduced into manufacturing to meet the performance needs of the advanced semiconductor products. By providing more data to the technologists as they design the new processes and tools it is hoped the industry can avoid the use of materials that may be unacceptable from a long-term industry sustainability perspective.