AVS 52nd International Symposium
    Surface Science Tuesday Sessions
       Session SS2-TuM

Paper SS2-TuM6
Defects Modeled with Vicinally-Stepped Oxide Surfaces: the Adsorption of Bromobenzene on NiO(100)

Tuesday, November 1, 2005, 10:00 am, Room 203

Session: Defects on Oxide Surfaces
Presenter: M.A. Langell, University of Nebraska-Lincoln
Authors: E.M. Marsh, University of Nebraska-Lincoln
S.C. Petitto, University of Nebraska-Lincoln
M.A. Langell, University of Nebraska-Lincoln
Correspondent: Click to Email
The chemical reactivity of a metal oxide surface is often dominated by its defect properties. However, at naturally-occurring levels these defects are often present in low concentrations and as only one of a range of defect types making their effect on surface reactivity difficult to isolate. We have modeled oxide step defects with periodically-stepped NiO(100) substrates, where the predominant defect type and concentration can be readily controlled, and have investigated the ability of the stepped substrates to adsorb and dissociate bromobenzene (C@sub 6@H@sub 5@Br). The surfaces were characterized using Auger electron (AES) and x-ray photoelectron (XPS) spectroscopies, low energy electron diffraction (LEED), high resolution electron energy loss spectroscopy (HREELS) and thermal desorption mass spectrometry (TDS). In particular, the geometry of the adsorbate is correlated with short terrace widths and this in turn affects the dissociative nature of the adsorbate interaction.