AVS 52nd International Symposium
    Surface Science Tuesday Sessions
       Session SS-TuP

Paper SS-TuP12
Adsorption and Decomposition of Triethylsilane on Si(100)

Tuesday, November 1, 2005, 4:00 pm, Room Exhibit Hall C&D

Session: Surface Science Poster Session
Presenter: J.H. Craig, Jr., Bradley University
Authors: J. Lozano, Bradley University
D. Early, Bradley University
L. Bockewitz, Bradley University
J.H. Craig, Jr., Bradley University
P.W. Wang, Bradley University
K.R. Kimberlin, Bradley University
Correspondent: Click to Email
The adsorption and decomposition of triethylsilane (TES) on Si(100) were studied using temperature programmed desorption (TPD), high resolution electron energy loss spectroscopy (HREELS), and x-ray photoelectron spectroscopy (XPS). Si(100) samples were dosed with TES at 100K. Desorption of mass 27 (attributed to ethylene) takes place at 750K, followed by desorption of hydrogen at 815K. This is indicative of a ???-hydride elimination process that results in at least partial removal of carbon species from the surface. At multilayer coverages, physisorbed species accumulate on the surface, as indicated by a low temperature desorption peak at 170K. At the highest TES exposures (~10L), a second low temperature TPD peak appears at 280K. This suggests that the second-layer physisorbed state is slightly more tightly bound than multilayer TES. In order to confirm this, HREELS and XPS data were obtained immediately following sequential thermal anneals to increasing temperatures, which were determined by landmark features in the TPD spectra. A model of the thermal evolution of TES on Si(100) based on the results obtained will be presented.