AVS 52nd International Symposium
    Surface Science Monday Sessions
       Session SS-MoP

Paper SS-MoP9
Interaction of Water Vapor with Clean and Contaminated Ru Surfaces

Monday, October 31, 2005, 5:00 pm, Room Exhibit Hall C&D

Session: Surface Science Poster Session
Presenter: B.V. Yakshinskiy, Rutgers, The State University of New Jersey
Authors: B.V. Yakshinskiy, Rutgers, The State University of New Jersey
N.S. Faradzhev, Rutgers, The State University of New Jersey
T. Graber, Rutgers, The State University of New Jersey
T.E. Madey, Rutgers, The State University of New Jersey
Correspondent: Click to Email
We compare the interaction of water vapor (H@sub 2@O and D@sub 2@O) with two important surfaces of hcp Ru: the atomically-rough (10-10) and the smooth close-packed (0001) surfaces. Several methods, including temperature programmed desorption (TPD), x-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES) and low energy ion scattering (LEIS) were used to study adsorption/desorption processes of water on the clean surfaces, as well as on carbon-dosed, oxygen-dosed and air-exposed surfaces. Both H@sub 2@O and D@sub 2@O undergo partial dissociation upon adsorption/desorption on Ru(10-10), which is in contrast to Ru(0001), where there is a striking isotope effect: D@sub 2@O is adsorbed molecularly, without dissociation, whereas H@sub 2@O dissociates partially. The data show non-wetting behavior of water on the air-exposed or the carbon-covered surfaces, but water becomes more strongly bonded to an oxygen-dosed substrate. We also report on the electron-induced dissociation and the electron-stimulated desorption (ESD) of water adsorbed on these surfaces at low temperature. The data provide insights into recent controversy concerning the interaction of water with Ru surfaces.