AVS 52nd International Symposium
    Surface Science Monday Sessions
       Session SS-MoP

Paper SS-MoP4
Sulfur-CO Interactions on Cu(100) Films through Surface Resistivity and Infrared Reflectance Measurements

Monday, October 31, 2005, 5:00 pm, Room Exhibit Hall C&D

Session: Surface Science Poster Session
Presenter: C. Liu, Tufts University
Authors: C. Liu, Tufts University
R.G. Tobin, Tufts University
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Interactions between dissimilar adsorbates on Cu(100) thin films have been investigated experimentally through their effects on electrical transport in the metal. We report measurements of surface resisitivity induced by CO on 50 nm-thick epitaxial Cu(100) films preadsorbed with different amounts of sulfur, together with temperature-programmed desorption (TPD) and infrared reflectance measurements. Adsorbate-induced surface resistivity arises from the scattering of conduction electrons in the metal from the impurity potential created by the adsorbate. Previous experiments have shown that the scattering cross section of sulfur decreases with increasing coverage, indicating a strong sulfur-sulfur interaction.@footnote 1@ In the present work, sulfur-CO interactions are explored by measuring the slope of the resistivity vs. CO coverage curve as a function of sulfur precoverage. Effects of sulfur on CO's scattering cross section are revealed as changes in the slope. Sulfur-induced changes in CO adsorption are also monitored with infrared vibrational spectroscopy and TPD. @FootnoteText@ @footnote 1@R.G. Tobin, Surf. Sci. 524, 183 (2003).